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| Thin-film Deposition |
Thin film deposition is the technique of applying a thin
layer of material or coating on a surface to form layers to develop filters,
create reflective surfaces, increase insulation and conduction for the
protection. An example of thin-film deposition is a mirror where a thin layer of aluminum coating is applied on a sheet
of glass in order to make the surface reflective. Thin-film deposition services
are at the heart of the semiconductor industries, optical devices industries,
compact disk manufacturers, solar panels industries and glass industries.
The companies that provide thin film deposition services offer a variety of thin-film deposition systems including thermal evaporators,
PLD (pulsed laser deposition) systems, electron beam evaporators, TCVD (thermal
chemical vapor deposition) systems and more.
There are two methods of thin film deposition: chemical
& physical. The method of deposition depends on the purpose of the
deposition, thickness desired and material of the surface and the substrate.
Manufacturers seeking to apply thin films should consult with the experts to
understand the process and methods of thin film deposition. This will help him
to choose the best method and system for their industries under expert
guidance.
Let’s get the basic understanding of chemical thin film
deposition and physical thin film deposition methods.
Chemical
Deposition
In the chemical deposition method, a substrate is fully
submerged in a volatile chemical fluid that produces a chemical change on a
surface to deposit coating. In this method, every surface of the substrate is
equally coated with the substance material. Chemical vapor deposition (CVD) is
one of the highest-performance examples of chemical deposition methods.
Physical
Deposition
This method does not include any kind of chemical reaction;
it involves a wide range of technologies including thermodynamic, mechanical or
electromechanical processes. In this method to produce a thin film on the
substrate, a material is released from a source in a low-pressure environment
for accurate results. Thermal evaporation and sputtering are the two most
common techniques used in the physical vapor deposition (PVD) method.
According to the requirement of the manufacturer, a host
variety of coating options available including metals coating, oxides coating,
diamond coating, transparent conductors, insulators and more. If you are a
manufacturer and seeking to apply thin films as per your industry standards,
you should have well aware of the substance material is being used in your
manufacturing plant. You should search and consult with some reputed company
involved in thin film deposition services for expert consultation and guidance
before choosing the best deposition method and coating type for your industry.
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