With across the board utilization of electronic gadgets the semiconductor business has seen a considerable measure of changes in fabricate of semiconductor gadgets. Out of numerous stages for semiconductor manufacturing, fabrication procedure is one of the most important steps. For fabrication of functional layers over a substrate, the most commonly used technique is CVD (Chemical vapor Deposition).
CVD is done in various processes. One of them is HFCVD (Hot Filament Chemical Vapor Deposition). The Blue Wave hot filament chemical vapor deposition system was built to produce concentrated, dense, adherent and coherent poly-crystalline diamond films on silicon, metallic and ceramic substrates. The Hot Filament Chemical Vapor Deposition HFCVD mechanism is beneficial as it gives the poly-crystalline stores of significant uniform miniaturized scale structure. It can be scaled for creation or extensive territory statement at bring down cost.
To improve the deposition parameters of diamond films, the pressure, temperature and distance between the filament and the susceptor should be considered. In any case, it is hard to exactly gauge and foresee the fiber and susceptor temperature in connection to the connected power in a hot filament chemical vapor deposition (HF-CVD) framework. The machine is intended to store different types of jewel coatings (UNCD-ultra nano crystalline diamond, NCD-nano crystalline diamond) poly-crystalline diamond movies and 2D carbon-that is graphene, which have wide use in electronic industry.
Equipment specifications:
- This product has various fruitful features, which are mentioned below:
- Specially designed substrate heater to attain a maximum temperature of 800 C, with a facility for rotational capacity of 20 RPM for the substrate and vertical movement of 20-80 mm.
- A unique gas distribution system with mass flow controllers and bellow-sealed valves to ensure a controllable feed for deposition of mixed gases like methane, oxygen, acetylene and hydrogen.
- An extraordinarily designed-filament holder gathering made of molybdenum, with numerous Tungsten wires working with a LT control supply for warming up the gases.
- A state of the art PC-based control system with PLC or Lab View software, for total automatic system.
- A molybdenum holder, with biasing capability.
- A unique design of the sample holder, load lock transfer, and gas shower to provide proper distribution of gases for plasma generation and decomposition of the gases in the heated reactor area.
- An appropriate pump-based vacuum system to create a high vacuum level as well as maintain adequate process pressure with an automatic throttle-valve. Process pressure is monitored by a capacitance mono-meter for accurate pressure control.
Chemical vapor deposition is another method of making metal objects more resistant to wear and friction and longer lasting. In this method, a chemical is deposited over the metal work surface in a gaseous state. Gases are delivered into the reaction chamber at specific temperatures required for the chemical reaction. The gases condense and solidify over the metal when they come in contact with it. The temperature of the metal is also very important. It affects the condensation of the gas over the metal. The apparatus used in this are the gas delivery system, the reaction chamber, energy source, vacuum system, process control equipment, exhaust system, exhaust treatment system and substrate loading mechanism.
By-products are also produced in the process. However, these can be removed gas flow in the reaction chamber. It is mostly used in microfabrication processes. The materials deposited are: silicon, carbon fiber, carbon nanotubes, silicon germanium, monocrystalline, etc. This method is used in producing synthetic diamonds, optical fibers, nano machines, semi-conductors, etc.
