Functional materials are part of everyday life today, like a protective finish on devices, objects or tools to reduce wear & tear, coatings for decorations, sensors or medical applications. The material gets deposited as thin films using a large variety of deposition techniques and properties determine the growth of the film. The PLD technique is used to deposit high-quality films of materials and this technique uses high power laser pulses to melt, evaporate, and ionize material from the surface of a target. The ablated material is collected on an appropriately placed substrate upon which it condenses and the thin film is grown.
Brief Detailing About Pulse Laser Deposition (PLD) and the Systems-
PLD is a simple technique which uses pulses of laser energy for removing materials from the surface of a target. The vaporized material contains neutrals and ion electrons which are known as laser-produced plasma plume. It expands rapidly from the target surface and the growth occurs on a substrate. A large number of variables affect the properties of the film like laser fluence, background gas pressure, and substrate temperature.
The PLD system is a fully customizable state-of-the-art physical vapor deposition system designed for the synthesis of high-quality thin films and thin film research. The PLD systems are offering a variety of built-in and custom features such as an optimized 3-target carousel, substrate heater, and pressure adjustment. It is specially designed for easy integration with a variety of other deposition techniques and sources like Sputtering, Thermal Evaporation & CVD, E-beam, and more.
Shuttle Description of the PLD Systems
System Camber– It is a 12” diameter stainless steel ultra-high vacuum electro-polished spherical chamber with multiport compatibility. The ports are positioned in different positions and the chamber has flanged ports for substrate heater assembly & target assembly.
Target Carousel– It is capable of holding six 1” or three 2” OD targets which can be mounted with or without silver paste. It also has removable mechanical clip target holders in which targets can be mounted without the use of silver paste or ink.
Substrate Heating- The substrate heater is a closed–loop with 1.6 inches or 2.0 inches diameter Inconel substrate heater. The assembly of the heater is designed to be used for in-situ thermal annealing of oxide or nitride films during and after growth.
Vacuum Pumping– It has a variable speed Turbo Pump capable of achieving high vacuum efficiently and the stainless steel UHV gate valve with CF150 (8″ OD) flanges. There is Pneumatic Gate Valve between the chamber and turbo-pump.
Temperature Controller– The system has a PID programmable 8 segment profile including ramp, dwell, ramp, end, stop, etc. It has easy controls for manual as well as auto modes. It includes cables and connectors that operate with an SSR with phase angle firing.
The application includes high-temperature superconductors for high Q microwave filters and resonators. For better PLD system hire the PLD system development company. There is giant magneto resistance for recording heads and magnetic sensors. It also has transparent conductive oxides for displays and optically transparent electronics.
